Chemical vapor deposition furnace
Vacuum chemical vapor deposition furnace is suitable for the preparation of carbon-carbon composite materials and carbon-silicon composite materials by chemical vapor deposition, such as aircraft brake pads, friction pads and other special-shaped composite parts. It is an indispensable equipment for the production of aviation and aerospace materials. Its working principle is in a vacuum protective atmosphere, the use of resistance or medium frequency induction heating, at a certain temperature to crack the raw material gas prepared carbon-carbon and other composite materials.

Main feature
1. High degree of automation, can be equipped with PLC programmable logic controller and IPC man-machine interface control system.
2. High reliability, all parameters are closed loop control by PID intelligent controller, no interference.
3. Good repeatability, can effectively control the consistency of product quality.
4. Through the thermal field structure and control system independently developed by our company, to ensure the temperature uniformity of each point in the constant temperature zone.
5. High safety, through the PLC logic control program to achieve safety chain, with furnace body overpressure, overtemperature: cooling water pressure, water flow,
Water temperature; The abnormal alarm of various parameters such as inflation pressure and flow rate also prompts the conventional solution.
6. Through the exhaust tar filtration system independently developed by our company, the tar discharge can be effectively reduced and the maintenance cycle of the pump valve can be effectively extended
And service life.
7. Through the exhaust gas treatment system independently developed by our company, we can achieve exhaust emission standards. Equipment specifications can be designed according to customer requirements.
Furnace form
1. The type of horizontal chemical vapor deposition furnace is indicated by WCVD (where W stands for horizontal, CVD stands for chemical vapor deposition furnace).
2, according to the requirements can be used double door or single door structure, by the horizontal direction of loading and discharging vertical.
1. The model of vertical chemical vapor deposition furnace is represented by LCVD (L stands for vertical, CVD stands for chemical vapor deposition furnace).
2. According to the requirements, the upper and lower door structure can be used, and the material is loaded and discharged in the vertical direction
Technical index
1. Limit vacuum :≤10Pa(no-load, cold state)
2. Pressure rise rate :≤2Pa/h(no-load, cold)
3. Maximum operating temperature :1200℃.
4. Furnace temperature uniformity :±5℃(empty furnace 1000℃ insulation 1h/9 o 'clock)
5. Heating speed :5~10℃/min