Shandong Tinwing Machinery Manufacturing Co., Ltd.
Vacuum equipment
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Single crystal furnace
Application and technical parameters of single crystal furnace products
Short distance product use: This series of single crystal furnace is a special equipment for growing monocrystalline silicon materials by czochralase method.
Main technical parameters
VDR1500 single crystal furnace series Power supply :3 phase, 380V±10%,50HZ
Heater maximum heating power :150~200 KVA
Maximum heating voltage of heater :60V
Cold furnace limit vacuum :3Pa
Crystal diameter :Φ8"/ medium 10"
Melting capacity :150Kg
Main furnace chamber size: medium 1000x1400mm
Secondary chamber size: medium 350x2300mm
Seed pulling speed range :0.2~8mm/min
Seed speed range :≥300 mm/min
Seed speed range :2~40R/min
Crucible rising speed range :0.02~ 1.0mm /min
Crucible speed range :≥100 mm/min
Crucible speed range :0.2~15R/min
Seed lifting effective stroke :3100 mm
Effective stroke of crucible lifting :450mm
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